ION IMPLANT ANALYSIS OPTION

 Computes active dose, range, and straggle. Can model implants with various doses, energies and cap materials. Overlays theoretical and actual plots.

implant model.gif (10247 bytes)

 


HOME    ABOUT    REPS    NEW     PRODUCTS     SERVICES    CONTACTS   

LITERATURE    WEB SITE MAP


Copyright 1999-2010 Materials Development Corporation   All rights reserved